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Comptes Rendus Physique
Volume 7, n° 8
pages 858-874 (octobre 2006)
Doi : 10.1016/j.crhy.2006.10.005
Optical lithography-present and future challenges
Lithographie optique-défis présents et futurs
 

Burn J. Lin
TSMC, Ltd., Hsinchu, 300-77 Taiwan, ROC 

Abstract

Optical lithography has been an industrial workhorse for many decades. It has reached a wavelength of 193 nm, a Numerical Aperture (NA) of 0.93 but was facing difficulties to advance further until the debut of immersion lithography. This review deals with the limit of dry and immersion lithography systems, their present and future challenges to reach these very limits. A discussion of defects in immersion lithography, the status of immersion lithography, polarized illumination, high-index materials, solid-immersion mask, double exposure and double patterning is included. To cite this article: B.J. Lin, C. R. Physique 7 (2006).

The full text of this article is available in PDF format.
Résumé

La lithographie optique a été la technologie industrielle par excellence depuis plusieurs décennies. Elle est arrivée jusquʼà une longueur dʼonde de 193 nm et une ouverture numérique de 0,93 et elle rencontrait des difficultés pour progresser plus avant jusquʼà lʼentrée en lice de la lithographie en immersion. Cet article traite des limites des systèmes de lithographie sèche et en immersion, des défis présents et futurs pour pousser à lʼextrême limite cette technique. Est incluse une discussion sur les défauts en lithographie par immersion, le point sur cette lithographie en immersion, lʼillumination polarisée, les matériaux à fort indice de réfraction, les masques à immersion solide, la double exposition et la double impression. Pour citer cet article : B.J. Lin, C. R. Physique 7 (2006).

The full text of this article is available in PDF format.

Keywords : Microlithography, Optical lithography, Immersion lithography

Mots-clés : Microlithographie, Lithographie optique, Lithographie en immersion




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